METHOD FOR DETERMINING PROCESS-SPECIFIC DATA OF A VACUUM DEPOSITION PROCESS

• Main Author: LINSS VOLKER
• Format: Patent
• Language: English; Korean
• Published: 06.08.2012
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PURPOSE: A process-significant data determination method for a vacuum deposition process is provided to minimize an error in determination of process-significant data caused by measuring position and/or spectroscopy. CONSTITUTION: A process-significant data determination method for a vacuum deposition process comprises the steps of: determining three or more intensities of spectrum lines of two or more process materials from light emitting spectrum, determining a first relative intensity from a pair of the intensities based on a first mathematical relation, determining a second relative intensity from another pair of the intensities, and calculating an intensity relation(IV) as process-significant data from the first and second relative intensities.