THIN FILM DEPOSITION APPARATUS AND SUBSTRATE PROCESSING SYSTEM COMPRISING THE SAME

PURPOSE: Thin film deposition apparatus and substrate processing system comprising the same are provided to automate loading/unloading operations of a substrate by having substrates installed on a susceptor ascend and descend. CONSTITUTION: A deposition chamber(110) where a susceptor(120) is install...

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Bibliographic Details
Main Authors PARK, SANG JOON, LEE, HO YOUNG, HEO, JIN PIL, LEE, KYUNG CHEOL, JANG, WOOK SANG, SON, BYUNG GUK
Format Patent
LanguageEnglish
Korean
Published 24.07.2012
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: Thin film deposition apparatus and substrate processing system comprising the same are provided to automate loading/unloading operations of a substrate by having substrates installed on a susceptor ascend and descend. CONSTITUTION: A deposition chamber(110) where a susceptor(120) is installed includes a top lid(112) opening and closing a top aperture of a chamber body(111). A rotational device(125) operates the susceptor to rotate. An ascending member(130) separates substrates from the susceptor in ascending. An ascending driving unit(140) ascends the ascending member.
Bibliography:Application Number: KR20110004213