ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

PURPOSE: An illumination optical system, an exposure apparatus, and a method of manufacturing a device are provided to form uniform light intensity distribution by preventing uneven light angular distribution from a light source. CONSTITUTION: A divider(DIV) divides light from a light source and gen...

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Bibliographic Details
Main Author TSUJI TOSHIHIKO
Format Patent
LanguageEnglish
Korean
Published 11.07.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE: An illumination optical system, an exposure apparatus, and a method of manufacturing a device are provided to form uniform light intensity distribution by preventing uneven light angular distribution from a light source. CONSTITUTION: A divider(DIV) divides light from a light source and generates a plurality of fluxes. A first reflective integrator uniformizes light intensity distribution of a plurality of fluxes generated by the divider. A light concentrator(14) condenses the fluxes from the first reflective integrator. A second reflective integrator receives fluxes from light concentrator and lights an illuminated surface. An opening aperture(22) is arranged between the second reflective integrator and the illuminated space.
Bibliography:Application Number: KR20110145460