METHOD FOR MANUFACTURING CU WIRE PLATED PD
PURPOSE: A method for manufacturing a copper wire plated with palladium is provided to implement plating at relatively low current density by repetitively inserting and taking a copper wire in and out of a palladium plating bath. CONSTITUTION: A method for manufacturing a copper wire plated with pal...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
05.07.2012
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Subjects | |
Online Access | Get full text |
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Abstract | PURPOSE: A method for manufacturing a copper wire plated with palladium is provided to implement plating at relatively low current density by repetitively inserting and taking a copper wire in and out of a palladium plating bath. CONSTITUTION: A method for manufacturing a copper wire plated with palladium comprises the steps of: preparing a copper wire(S10), dipping the copper wire in a palladium plating bath(S30), and performing palladium plating on the top of the copper wire through pulse-reverse electroplating comprising a forward current period of 1-100msec and an off current period of 0.1-10msec. |
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AbstractList | PURPOSE: A method for manufacturing a copper wire plated with palladium is provided to implement plating at relatively low current density by repetitively inserting and taking a copper wire in and out of a palladium plating bath. CONSTITUTION: A method for manufacturing a copper wire plated with palladium comprises the steps of: preparing a copper wire(S10), dipping the copper wire in a palladium plating bath(S30), and performing palladium plating on the top of the copper wire through pulse-reverse electroplating comprising a forward current period of 1-100msec and an off current period of 0.1-10msec. |
Author | HWANG, HWA IEK CHOI, YOUNG HEE YOU, SUNG KUN LEE, HA NA |
Author_xml | – fullname: CHOI, YOUNG HEE – fullname: YOU, SUNG KUN – fullname: LEE, HA NA – fullname: HWANG, HWA IEK |
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Snippet | PURPOSE: A method for manufacturing a copper wire plated with palladium is provided to implement plating at relatively low current density by repetitively... |
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SubjectTerms | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
Title | METHOD FOR MANUFACTURING CU WIRE PLATED PD |
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