PHOTOMASK

PURPOSE: A photo mask is provided to improve resolution by forming a silicon coating layer on one side or both sides of a glass substrate. CONSTITUTION: A photo mask(100) comprises a glass substrate(110), a chrome layer(120) and a silicon coating layer(130). The chrome layer is formed on one side of...

Full description

Saved in:
Bibliographic Details
Main Authors KIM, HYE JIN, RYU, CHANG SUP, KIM, GOING SIK
Format Patent
LanguageEnglish
Korean
Published 28.06.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

Abstract PURPOSE: A photo mask is provided to improve resolution by forming a silicon coating layer on one side or both sides of a glass substrate. CONSTITUTION: A photo mask(100) comprises a glass substrate(110), a chrome layer(120) and a silicon coating layer(130). The chrome layer is formed on one side of the glass substrate as a shielding layer. The silicon coating layer is formed on one side of the chrome layer as a reflection layer. The silicon coating layer is formed on the other side of the glass substrate.
AbstractList PURPOSE: A photo mask is provided to improve resolution by forming a silicon coating layer on one side or both sides of a glass substrate. CONSTITUTION: A photo mask(100) comprises a glass substrate(110), a chrome layer(120) and a silicon coating layer(130). The chrome layer is formed on one side of the glass substrate as a shielding layer. The silicon coating layer is formed on one side of the chrome layer as a reflection layer. The silicon coating layer is formed on the other side of the glass substrate.
Author RYU, CHANG SUP
KIM, HYE JIN
KIM, GOING SIK
Author_xml – fullname: KIM, HYE JIN
– fullname: RYU, CHANG SUP
– fullname: KIM, GOING SIK
BookMark eNrjYmDJy89L5WTgDPDwD_H3dQz25mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGRgYGZpZA7GhMnCoAa-8eNA
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID KR20120069006A
GroupedDBID EVB
ID FETCH-epo_espacenet_KR20120069006A3
IEDL.DBID EVB
IngestDate Fri Jul 19 16:07:17 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
Korean
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_KR20120069006A3
Notes Application Number: KR20100108131
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120628&DB=EPODOC&CC=KR&NR=20120069006A
ParticipantIDs epo_espacenet_KR20120069006A
PublicationCentury 2000
PublicationDate 20120628
PublicationDateYYYYMMDD 2012-06-28
PublicationDate_xml – month: 06
  year: 2012
  text: 20120628
  day: 28
PublicationDecade 2010
PublicationYear 2012
RelatedCompanies SAMSUNG ELECTRO-MECHANICS CO., LTD
RelatedCompanies_xml – name: SAMSUNG ELECTRO-MECHANICS CO., LTD
Score 2.8166726
Snippet PURPOSE: A photo mask is provided to improve resolution by forming a silicon coating layer on one side or both sides of a glass substrate. CONSTITUTION: A...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Title PHOTOMASK
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120628&DB=EPODOC&locale=&CC=KR&NR=20120069006A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQMTY2TUpKSjTUTUsxT9Y1AVYYukkWxoa6yWmJpqbABrqFRSJoN7Kvn5lHqIlXhGkEE0MObC8M-JzQcvDhiMAclQzM7yXg8roAMYjlAl5bWayflAkUyrd3C7F1UYP2jg2NQFsC1VycbF0D_F38ndWcnW29g9T8giByoFN5DcwcmRlYgQ1pc1B-cA1zAu1LKUCuVNwEGdgCgObllQgxMGXnCzNwOsPuXhNm4PCFTnkLM7CD12gmFwMFofmwWISBM8DDP8Tf1zHYW5RB2c01xNlDF2h6PNwz8d5ByE4xFmNgAXbzUyUYFJJTgFWDeYpZErBNYmJmlpSYYpRsAexBpqUkWpglGyZKMsjgM0kKv7Q0AxeIC1rkZGQhw8BSUlSaKgusTkuS5MChAAAP2nVg
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1ZS8NAEB5qPeKbRsWjHqDkLWjuvARpcxBNcxCj9K1kNw2IYouJ-PedXVPtU193YNhd-Pab2Z1vFuBG0wxCSKnIdWVRWUfCkImtKTKtS8PAAN22S6ZGjhMzfNYfJ8akB-9LLQzvE_rNmyMioijiveXn9eL_EsvjtZXNLXnFofl9UDie1GXHisokgZI3cvws9VJXcl0nyqUk_7Wxrrx35nADNjHIthge_JcR06UsVkkl2IOtDP19tPvQe5uLILjLv9dE2Im7J28RtnmNJm1wsMNhcwBCFqZFGg-fokO4DvzCDWX0Pv1bzDTKV6eiHUEf0_zZMVzRCqnBqkyCMYlumqSsVGpjBllXpW1SpTyBwTpPp-vNlyCERTyejh-S6Ax2mYkVPKn2APrt59fsHKm1JRd8R34Auy14Uw
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=PHOTOMASK&rft.inventor=KIM%2C+HYE+JIN&rft.inventor=RYU%2C+CHANG+SUP&rft.inventor=KIM%2C+GOING+SIK&rft.date=2012-06-28&rft.externalDBID=A&rft.externalDocID=KR20120069006A