PHOTOMASK

PURPOSE: A photo mask is provided to improve resolution by forming a silicon coating layer on one side or both sides of a glass substrate. CONSTITUTION: A photo mask(100) comprises a glass substrate(110), a chrome layer(120) and a silicon coating layer(130). The chrome layer is formed on one side of...

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Bibliographic Details
Main Authors KIM, HYE JIN, RYU, CHANG SUP, KIM, GOING SIK
Format Patent
LanguageEnglish
Korean
Published 28.06.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A photo mask is provided to improve resolution by forming a silicon coating layer on one side or both sides of a glass substrate. CONSTITUTION: A photo mask(100) comprises a glass substrate(110), a chrome layer(120) and a silicon coating layer(130). The chrome layer is formed on one side of the glass substrate as a shielding layer. The silicon coating layer is formed on one side of the chrome layer as a reflection layer. The silicon coating layer is formed on the other side of the glass substrate.
Bibliography:Application Number: KR20100108131