Apparatus for forming copper oxide film

• Main Author: SONG, YOUNG UK
• Format: Patent
• Language: English; Korean
• Published: 12.06.2012
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING; CLEANING IN GENERAL; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

PURPOSE: An apparatus for forming an oxide film is provided to prevent a bio film formed by the penetration of polluted sea water by easily and efficiently forming an oxide film inside a Cu-Ni pipe of a ship. CONSTITUTION: An apparatus for forming an oxide film comprises a clean water supply unit(20), a chemical supply unit(30) which is provided separately from the clean water supply unit and supplies chemical for forming an oxide film in a ship pipe, and a mixed solution supply unit(50) which is coupled to the ship pipe and supplies a mixed solution of clean water and chemical to the ship pipe.