EXPOSURE APPARATUS

PURPOSE: An exposure apparatus is provided to overcome the breaking defects of a photo-mask by eliminating stepped parts due to bubble generated from a vacuum-based absorbing process. CONSTITUTION: An exposure apparatus includes a photo-mask(100) and a support(120). The photo-mask is composed of a t...

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Bibliographic Details
Main Authors KIM, HYE JIN, KIM, GOING SIK
Format Patent
LanguageEnglish
Korean
Published 08.06.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An exposure apparatus is provided to overcome the breaking defects of a photo-mask by eliminating stepped parts due to bubble generated from a vacuum-based absorbing process. CONSTITUTION: An exposure apparatus includes a photo-mask(100) and a support(120). The photo-mask is composed of a transparent substrate(111), a light shielding film(112), a silicon layer(114), and a groove part(150). The light shielding film is formed at the transparent substrate. A light absorbing pattern is formed at the light shielding film. The silicon layer is formed at the light shielding film. The silicon layer is in contact with one side of a target to be transferred. The groove part is recessively formed from the silicon layer to the inner part of the light shielding film. The support supports the rear part of the target to be transferred. Etching resist(135) is applied on the surface of the target to be transferred. The groove part is continuously formed along the inner frame side of the silicon layer in contact with the target to be transferred.
Bibliography:Application Number: KR20100120777