METHOD OF FORMING A FINE PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME
PURPOSE: A method for forming micro patterns and a method for manufacturing a display substrate using the same are provided to coat a polymer layer on a base substrate on which a photoresist pattern is formed to perform annealing, thereby generating micro patterns without additional processes. CONST...
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Main Authors | , , , , |
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Format | Patent |
Language | English Korean |
Published |
07.06.2012
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A method for forming micro patterns and a method for manufacturing a display substrate using the same are provided to coat a polymer layer on a base substrate on which a photoresist pattern is formed to perform annealing, thereby generating micro patterns without additional processes. CONSTITUTION: A wiring unit(300) receives driving signals for driving a gate driving circuit from the outside. The wiring unit provides the driving signals to the gate driving circuit. A first wiring unit of the wiring unit comprises the following units. A power line(310) transfers a power signal. A first clock line(320) transfers a first clock signal. A second clock line(330) transfers a second clock signal. An initiation line(340) transfers a vertical initiation signal. |
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Bibliography: | Application Number: KR20100119694 |