ACTIVATION OF ELECTRODE SURFACES BY MEANS OF VACUUM DEPOSITION TECHNIQUES IN A CONTINUOUS PROCESS

• Main Authors: RAMUNNI ENRICO, URGEGHE CHRISTIAN, GULLA ANDREA FRANCESCO, MARTELLI GIAN NICOLA, IACOPETTI LUCIANO, ANTOZZI ANTONIO LORENZO
• Format: Patent
• Language: English; Korean
• Published: 16.05.2012
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a method of manufacturing of metal electrodes for electrolytic applications by means of a continuous deposition of a layer of noble metals upon metal substrates by a physical vapour deposition technique.