COATING APPARATUS AND METHOD OF FORMING COATING LAYER USING THE SAME
PURPOSE: A coating apparatus and a coating film forming method using the same are provided to prevent the occurrence of coating defects due to the thickness difference of photoresist. CONSTITUTION: A coating apparatus includes a nozzle part(125), a moving shaft(110), a rotary connecting member(112),...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
07.05.2012
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A coating apparatus and a coating film forming method using the same are provided to prevent the occurrence of coating defects due to the thickness difference of photoresist. CONSTITUTION: A coating apparatus includes a nozzle part(125), a moving shaft(110), a rotary connecting member(112), a stage(140), and a washing unit(162). The nozzle part is composed of a nozzle tip(122) and a head(120). The nozzle tip sprays coating liquid, and the head stores the coating liquid. The moving shaft linearly moves the nozzle part. The rotary connecting member connects the moving shaft and the nozzle part and rotates the nozzle part. The stage is arranged at the lower side of the moving shaft. The nozzle part is fixed to the perpendicular direction of the surface of the stage. |
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Bibliography: | Application Number: KR20100105626 |