GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PURPOSE: A gas manifold, a module for a lithographic apparatus, a lithographic apparatus, and a method for manufacturing a device are provided to achieve dynamic balance by being formed to introduce turbulences to gas within a manifold through vibration. CONSTITUTION: An influx unit(12) offers gas f...

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Main Authors VAN BOXTEL FRANK JOHANNES JACOBUS, VAN DAM MARINUS JOHANNES MARIA, PIETERSE GERBEN, VAN DER STEEN ANTONIUS ARNOLDUS HENRICUS, JASPER JOHANNES CHRISTIAAN MARIA, BARAGONA MARCO, VAN DER HAM RONALD, SHULEPOV SERGEI, DEBRAUWER PIETER
Format Patent
LanguageEnglish
Korean
Published 27.04.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A gas manifold, a module for a lithographic apparatus, a lithographic apparatus, and a method for manufacturing a device are provided to achieve dynamic balance by being formed to introduce turbulences to gas within a manifold through vibration. CONSTITUTION: An influx unit(12) offers gas flow to a gas manifold. A diffuser(16) offers decreased pressure to the gas flow. A flow straightener(18) makes the flow of the gas escaping from the diffuser straight. A contractor(20) is formed in the downstream of the flow straightener. An outlet unit offers the gas flow to two plates(52,54).
Bibliography:Application Number: KR20110105936