APPARATUS AND METHOD FOR MONITORING LASER PROCESSING STATUS USING PLASMA
PURPOSE: Laser processing condition monitoring apparatus and method using plasma are provided to effectively monitor and analyze the processed condition of objects using the plasma generated from the processed objects. CONSTITUTION: A laser processing condition monitoring method comprises the follow...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
25.04.2012
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: Laser processing condition monitoring apparatus and method using plasma are provided to effectively monitor and analyze the processed condition of objects using the plasma generated from the processed objects. CONSTITUTION: A laser processing condition monitoring method comprises the following steps: irradiating an object(102) with a pulse laser(107) for processing; and detecting light(200) transmitted from the plasma(106) generated from the object for monitoring the processed condition of the object. The peak power of the pulse laser is controlled to process the object with a nonlinear optic phenomenon. |
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Bibliography: | Application Number: KR20100100780 |