LIGHT IRRADIATION DEVICE FOR EXPOSURE DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, PRODUCTION METHOD FOR SUBSTRATE, MASK AND EXPOSED SUBSTRATE
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
20.04.2012
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Subjects | |
Online Access | Get full text |
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Author | TOGASHI TAKUMI KAWASHIMA HIRONORI HASHINAGA HIROSHI MATSUZAKA MASAAKI |
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RelatedCompanies | NSK TECHNOLOGY CO., LTD |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
Title | LIGHT IRRADIATION DEVICE FOR EXPOSURE DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, PRODUCTION METHOD FOR SUBSTRATE, MASK AND EXPOSED SUBSTRATE |
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