ELECTRODEPOSITION OF CONIP FILMS

PURPOSE: An electrodeposition of CoNiP films is provided to quantify the magnetic characteristics of the CoNiP layer with the residual magnetic flux. CONSTITUTION: The substrate(110) is arranged in the electroplating bath(115). The electroplating bath comprises the electroplating composition(120). T...

Full description

Saved in:
Bibliographic Details
Main Authors TANG MICHAEL XUEFEI, VENKATASAMY VENKATRAM, TABAKOVIC IBRO, SUN MING
Format Patent
LanguageEnglish
Korean
Published 09.04.2012
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PURPOSE: An electrodeposition of CoNiP films is provided to quantify the magnetic characteristics of the CoNiP layer with the residual magnetic flux. CONSTITUTION: The substrate(110) is arranged in the electroplating bath(115). The electroplating bath comprises the electroplating composition(120). The electroplating composition comprises the nickel source, and the cobalt source, the phosphorus source of at least about 0.1 M. The evaporation current is applied in the substrate. The CoNiP layer having the thickness of 500 nanometers is electro-deposited on the substrate.
Bibliography:Application Number: KR20110099739