ELECTRODEPOSITION OF CONIP FILMS
PURPOSE: An electrodeposition of CoNiP films is provided to quantify the magnetic characteristics of the CoNiP layer with the residual magnetic flux. CONSTITUTION: The substrate(110) is arranged in the electroplating bath(115). The electroplating bath comprises the electroplating composition(120). T...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
09.04.2012
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: An electrodeposition of CoNiP films is provided to quantify the magnetic characteristics of the CoNiP layer with the residual magnetic flux. CONSTITUTION: The substrate(110) is arranged in the electroplating bath(115). The electroplating bath comprises the electroplating composition(120). The electroplating composition comprises the nickel source, and the cobalt source, the phosphorus source of at least about 0.1 M. The evaporation current is applied in the substrate. The CoNiP layer having the thickness of 500 nanometers is electro-deposited on the substrate. |
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Bibliography: | Application Number: KR20110099739 |