TARGET BASED ON MOLYBDENUM AND PRODUCTION METHOD WITH THERMAL PROJECTION OF A TARGET

A target of a nominal thickness includes molybdenum. The target has a lamellar microstructure and an oxygen content of less than 1000 ppm, preferably less than 600 ppm, and even more preferably less than 450 ppm. An electrical resistivity of the target is less than five times, preferably three times...

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Bibliographic Details
Main Author BILLIERES DOMINIQUE
Format Patent
LanguageEnglish
Korean
Published 13.03.2012
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:A target of a nominal thickness includes molybdenum. The target has a lamellar microstructure and an oxygen content of less than 1000 ppm, preferably less than 600 ppm, and even more preferably less than 450 ppm. An electrical resistivity of the target is less than five times, preferably three times and more preferably twice the theoretical electrical resistivity of the compound.
Bibliography:Application Number: KR20117023563