TARGET BASED ON MOLYBDENUM AND PRODUCTION METHOD WITH THERMAL PROJECTION OF A TARGET
A target of a nominal thickness includes molybdenum. The target has a lamellar microstructure and an oxygen content of less than 1000 ppm, preferably less than 600 ppm, and even more preferably less than 450 ppm. An electrical resistivity of the target is less than five times, preferably three times...
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Main Author | |
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Format | Patent |
Language | English Korean |
Published |
13.03.2012
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Subjects | |
Online Access | Get full text |
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Summary: | A target of a nominal thickness includes molybdenum. The target has a lamellar microstructure and an oxygen content of less than 1000 ppm, preferably less than 600 ppm, and even more preferably less than 450 ppm. An electrical resistivity of the target is less than five times, preferably three times and more preferably twice the theoretical electrical resistivity of the compound. |
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Bibliography: | Application Number: KR20117023563 |