DUAL STAGE SYSTEM AND METHOD FOR PROCESSING FRIT USING THE SAME

PURPOSE: A dual stage system and a frit processing method using the same are provided to improve production efficiency by consecutively processing frit without waste of time for mask and substrate arrangements. CONSTITUTION: A first substrate table(110) is linearly transferred with a substrate(20)....

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Bibliographic Details
Main Authors LEE, JUNG HYUN, JEON, KWANG JIN, CHOI, EI HO, HAM, BYOUNG CHUL, PARK, HONG JIN, LEE, SUN PIL, HAN, JAE BONG
Format Patent
LanguageEnglish
Korean
Published 07.03.2012
Subjects
BASIC ELECTRIC ELEMENTS
CLADDING OR PLATING BY SOLDERING OR WELDING
CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MACHINE TOOLS
METAL-WORKING NOT OTHERWISE PROVIDED FOR
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SOLDERING OR UNSOLDERING
TRANSPORTING
WELDING
WORKING BY LASER BEAM
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Summary:PURPOSE: A dual stage system and a frit processing method using the same are provided to improve production efficiency by consecutively processing frit without waste of time for mask and substrate arrangements. CONSTITUTION: A first substrate table(110) is linearly transferred with a substrate(20). A first mask table(120) is arranged on the upper side of the first substrate table. A first lower part imaging part(130) is comprised of a pair of cameras and a pair of lens parts. A second substrate table(140) is linearly transferred by receiving driving force of a substrate stage. A second mask table(150) supports the edge of a mask(10).
Bibliography:Application Number: KR20100083557