STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING AN OBJECT TABLE

PURPOSE: A stage device, a lithography device, and a lithography method are provided to increase accuracy of a measurement system by suppressing the movement or deformation of a grid plate due to external distortion in a scanning movement process. CONSTITUTION: A first measurement system(MS1) is mou...

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Bibliographic Details
Main Authors JEUNINK ANDRE BERNARDUS, VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS, VAN LEEUWEN ROBBERT EDGAR, EUSSEN EMIEL JOZEF MELANIE
Format Patent
LanguageEnglish
Korean
Published 06.03.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A stage device, a lithography device, and a lithography method are provided to increase accuracy of a measurement system by suppressing the movement or deformation of a grid plate due to external distortion in a scanning movement process. CONSTITUTION: A first measurement system(MS1) is mounted on an object table(OT). A second measurement system(MS2) is mounted on a frame(3). A control unit(CU) generates a control signal which controls a position setting device. A mounting device(7) mounts the second measurement system on the frame. A position sensor includes one or more capacitive sensors.
Bibliography:Application Number: KR20110084530