APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

PURPOSE: An apparatus and a method for processing a substrate are provided to improve a processing efficiency by reducing a time requiring for processing a substrate by processing a target area in a detected substrate. CONSTITUTION: An align unit(20) aligns a substrate to determine the position ther...

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Main Authors KIM, BUM JOONG, RYU, BENG SO, JUNG, HONG JIN, KWAK, JONG HO, KIM, HARK YONG, HONG, SUN YOUNG, LEE, BYONG SHIK, JANG, HYEON SAM, KIM, YOUNG YONG
Format Patent
LanguageEnglish
Korean
Published 27.02.2012
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An apparatus and a method for processing a substrate are provided to improve a processing efficiency by reducing a time requiring for processing a substrate by processing a target area in a detected substrate. CONSTITUTION: An align unit(20) aligns a substrate to determine the position thereof. The align unit comprises a plurality of support members supporting the both sides of the substrate and also includes a transport unit. The transport unit transfers the support members to be close to each other or separated from each other. A support member(211) pressing the both sides of the substrate is formed in the support member. A detecting unit(30) detects the location of a target region of the substrate. A processing unit processes the target region which is detected by the detection unit.
Bibliography:Application Number: KR20100079469