LOW-IRRITATING, CLEAR CLEANSING COMPOSITIONS WITH RELATIVELY LOW PH
PURPOSE: A transparent skin cleaning composition with low skin irritation is provided to secure the high clarity of the composition by when having the low pH, and offer the high foam generation rate. CONSTITUTION: A transparent skin cleaning composition contains the following: a non-crosslinked line...
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Main Authors | , , , , |
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Format | Patent |
Language | English Korean |
Published |
30.12.2011
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A transparent skin cleaning composition with low skin irritation is provided to secure the high clarity of the composition by when having the low pH, and offer the high foam generation rate. CONSTITUTION: A transparent skin cleaning composition contains the following: a non-crosslinked linear acryl copolymer having the low molecular weight; and a non-ethoxylated negative ionic surfactant. The transparent skin cleaning composition contains over 2wt% of non-ethoxylated negative ionic surfactant. The pH of the transparent skin cleaning composition is less than 6.2. |
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Bibliography: | Application Number: KR20110061018 |