LOW-IRRITATING, CLEAR CLEANSING COMPOSITIONS WITH RELATIVELY LOW PH

PURPOSE: A transparent skin cleaning composition with low skin irritation is provided to secure the high clarity of the composition by when having the low pH, and offer the high foam generation rate. CONSTITUTION: A transparent skin cleaning composition contains the following: a non-crosslinked line...

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Bibliographic Details
Main Authors GUNN EUEN T, WALTERS RUSSEL M, GANDOLFI LISA, ANIM DANSO EMMANUEL, JOHNSON DONZEL
Format Patent
LanguageEnglish
Korean
Published 30.12.2011
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Summary:PURPOSE: A transparent skin cleaning composition with low skin irritation is provided to secure the high clarity of the composition by when having the low pH, and offer the high foam generation rate. CONSTITUTION: A transparent skin cleaning composition contains the following: a non-crosslinked linear acryl copolymer having the low molecular weight; and a non-ethoxylated negative ionic surfactant. The transparent skin cleaning composition contains over 2wt% of non-ethoxylated negative ionic surfactant. The pH of the transparent skin cleaning composition is less than 6.2.
Bibliography:Application Number: KR20110061018