DISPLACEMENT DEVICE, LITHOGRAPHIC APPARATUS AND POSITIONING METHOD

• Main Authors: OTTENS JOOST JEROEN, VAN DE RIJDT JOHANNES HUBERTUS ANTONIUS, VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS, MANDERS ERIK JOHANNES ANTONIUS
• Format: Patent
• Language: English; Korean
• Published: 14.12.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; DYNAMO-ELECTRIC MACHINES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERATION; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A displacement device, a lithographic apparatus, and a positioning method are provided to reduce crosstalk of a magnet of a first part and a coil block unit of a second part about another positioning device. CONSTITUTION: An illumination system(IL) adjusts an emitting beam(B). A support object(MT) supports a patterning device(MA). The patterning device assigns a pattern onto the section of the emitting beam to form a pattern emitting beam. A substrate table(WT) maintains a substrate. A projecting system(PS) projects the patterned emitting beam onto the target area of the substrate.