DISPLACEMENT DEVICE, LITHOGRAPHIC APPARATUS AND POSITIONING METHOD
PURPOSE: A displacement device, a lithographic apparatus, and a positioning method are provided to reduce crosstalk of a magnet of a first part and a coil block unit of a second part about another positioning device. CONSTITUTION: An illumination system(IL) adjusts an emitting beam(B). A support obj...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
14.12.2011
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A displacement device, a lithographic apparatus, and a positioning method are provided to reduce crosstalk of a magnet of a first part and a coil block unit of a second part about another positioning device. CONSTITUTION: An illumination system(IL) adjusts an emitting beam(B). A support object(MT) supports a patterning device(MA). The patterning device assigns a pattern onto the section of the emitting beam to form a pattern emitting beam. A substrate table(WT) maintains a substrate. A projecting system(PS) projects the patterned emitting beam onto the target area of the substrate. |
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Bibliography: | Application Number: KR20110054170 |