DISPLACEMENT DEVICE, LITHOGRAPHIC APPARATUS AND POSITIONING METHOD

PURPOSE: A displacement device, a lithographic apparatus, and a positioning method are provided to reduce crosstalk of a magnet of a first part and a coil block unit of a second part about another positioning device. CONSTITUTION: An illumination system(IL) adjusts an emitting beam(B). A support obj...

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Bibliographic Details
Main Authors OTTENS JOOST JEROEN, VAN DE RIJDT JOHANNES HUBERTUS ANTONIUS, VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS, MANDERS ERIK JOHANNES ANTONIUS
Format Patent
LanguageEnglish
Korean
Published 14.12.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
DYNAMO-ELECTRIC MACHINES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GENERATION
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A displacement device, a lithographic apparatus, and a positioning method are provided to reduce crosstalk of a magnet of a first part and a coil block unit of a second part about another positioning device. CONSTITUTION: An illumination system(IL) adjusts an emitting beam(B). A support object(MT) supports a patterning device(MA). The patterning device assigns a pattern onto the section of the emitting beam to form a pattern emitting beam. A substrate table(WT) maintains a substrate. A projecting system(PS) projects the patterned emitting beam onto the target area of the substrate.
Bibliography:Application Number: KR20110054170