PHOTOSENSITIVE RESIN COMPOSITION, OPTICAL WAVEGUIDE FILM, FILM FOR FORMATION OF OPTICAL WAVEGUIDE, OPTICAL INTERCONNECTION, OPTO-ELECTRIC HYBRID BOARD, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE FILM

A photosensitive resin composition which includes (A) a cyclic olefin; (B) at least either one of a monomer having a cyclic ether group and an oligomer having a cyclic ether group, having a refractive index different from that of the component (A); and (C) a photoacid generator, is provided.

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Bibliographic Details
Main Authors TAKAHAMA KEIZO, MORI TETSUYA
Format Patent
LanguageEnglish
Korean
Published 04.11.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Summary:A photosensitive resin composition which includes (A) a cyclic olefin; (B) at least either one of a monomer having a cyclic ether group and an oligomer having a cyclic ether group, having a refractive index different from that of the component (A); and (C) a photoacid generator, is provided.
Bibliography:Application Number: KR20117018505