SILVER ALLOY TARGET FOR FORMING REFLECTION ELECTRODE FILM FOR ORGANIC EL ELEMENT, AND METHOD FOR MANUFACTURING THE SILVER ALLOY TARGET

• Main Authors: KOMIYAMA SHOZO, ITO IKUO
• Format: Patent
• Language: English; Korean
• Published: 14.10.2011
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

[Abstract] Disclosed is a silver alloy target for forming a reflective electrode film for an organic EL element, which has a component composition containing 0.1% to 1.5% by mass of In and the remainder composed of Ag and unavoidable impurities. The average grain diameter of the crystal grain of the alloy is 150 to 400 µm, and the dispersion of the grain diameter of the crystal grain is 20% of the average grain diameter or less.