ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS

An illumination system comprising a polarization member which comprises first and second polarization modifiers each connected to an actuator configured to move a respective polarization modifier into at least partial intersection with a radiation beam such that the polarization modifier applies a m...

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Bibliographic Details
Main Authors DEGUENTHER MARKUS, MULDER HEINE MELLE, HANSEN STEVEN GEORGE, MULKENS JOHANNES CATHARINUS HUBERTUS
Format Patent
LanguageEnglish
Korean
Published 28.09.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:An illumination system comprising a polarization member which comprises first and second polarization modifiers each connected to an actuator configured to move a respective polarization modifier into at least partial intersection with a radiation beam such that the polarization modifier applies a modified polarization to at least part of the radiation beam, and an array of individually controllable reflective elements which is positioned to receive the radiation beam after it has passed the polarization member, the illumination system further comprising a controller capable of controlling the actuators such that the first and second polarization modifiers intersect with different portions of the radiation beam.
Bibliography:Application Number: KR20110025353