FORMING METHOD OF NANO STRUCTURE USING THE METAL NANO RING PATTERN

• Main Authors: SEO, YOUNG HO, SHIN, HONG GUE, PARK, YONG MIN, KIM, BYEONG HEE
• Format: Patent
• Language: English; Korean
• Published: 23.08.2011
• Subjects: MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT THEREOF; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS; NANOTECHNOLOGY; PERFORMING OPERATIONS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING

PURPOSE: A method for manufacturing a nano structure using a metal nano-ring pattern is provided to cost-effectively improve the precision of the metal nano-ring pattern through a simplified manufacturing process. CONSTITUTION: A metal film is formed on one side of a substrate(12) by depositing metal. The metal film is anodized to form a metal oxide film without a plurality of first nano-holes, and the anodizing process is implemented until a part of the bottom side of the metal oxide film is in contact with the substrate. The metal oxide film is eliminated to form a metal nano-ring pattern(10) with a plurality of second nano-holes(141) is formed. The substrate is etched using the metal nano-ring pattern as an etching mask to form a plurality of third nano-holes(121) on the substrate.