ANNEALING PROCESS FOR ANNEALING A STRUCTURE

PURPOSE: An annealing process is provided to manufacture a hetero structure without any defect. CONSTITUTION: An annealing process anneals a structure in non-oxidizing atmosphere to form an oxide layer(310) on a part of the exposed surface of the structure which is contacted with a holder(312) in a...

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Main Authors BARGE THIERRY, LAGAHE BLANCHARD CHRYSTELLE, ASPAR BERNARD, SOUSBIE NICOLAS
Format Patent
LanguageEnglish
Korean
Published 02.08.2011
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Summary:PURPOSE: An annealing process is provided to manufacture a hetero structure without any defect. CONSTITUTION: An annealing process anneals a structure in non-oxidizing atmosphere to form an oxide layer(310) on a part of the exposed surface of the structure which is contacted with a holder(312) in a first location. The process moves the oxidized structure in the holder to a second location or the contacting area between the structure and the holder in the first location. The oxidized structure of the second position in the non-oxidizing atmosphere is annealed in a second annealing step.
Bibliography:Application Number: KR20100124986