ANNEALING PROCESS FOR ANNEALING A STRUCTURE

PURPOSE: An annealing process is provided to manufacture a hetero structure without any defect. CONSTITUTION: An annealing process anneals a structure in non-oxidizing atmosphere to form an oxide layer(310) on a part of the exposed surface of the structure which is contacted with a holder(312) in a...

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Bibliographic Details
Main Authors BARGE THIERRY, LAGAHE BLANCHARD CHRYSTELLE, ASPAR BERNARD, SOUSBIE NICOLAS
Format Patent
LanguageEnglish
Korean
Published 02.08.2011
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An annealing process is provided to manufacture a hetero structure without any defect. CONSTITUTION: An annealing process anneals a structure in non-oxidizing atmosphere to form an oxide layer(310) on a part of the exposed surface of the structure which is contacted with a holder(312) in a first location. The process moves the oxidized structure in the holder to a second location or the contacting area between the structure and the holder in the first location. The oxidized structure of the second position in the non-oxidizing atmosphere is annealed in a second annealing step.
Bibliography:Application Number: KR20100124986