PULSE TRAIN ANNEALING METHOD AND APPARATUS

PURPOSE: A pulse train annealing method and a device thereof are provided to adjust the shape, the peak power level, and/or an energy amount which are transferred from each pulse, thereby improving an annealing process. CONSTITUTION: A plurality of first energy pulses is transferred to the first par...

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Bibliographic Details
Main Authors MOFFATT STEPHEN, RANISH JOSEPH MICHAEL
Format Patent
LanguageEnglish
Korean
Published 21.07.2011
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A pulse train annealing method and a device thereof are provided to adjust the shape, the peak power level, and/or an energy amount which are transferred from each pulse, thereby improving an annealing process. CONSTITUTION: A plurality of first energy pulses is transferred to the first part of a substrate(100). The substrate is moved. A plurality of second energy pulses is transferred to the second part of the substrate. Each of the first and second energy pulses includes at least thirty pulses. Each of the first and second energy pulses has a period which is from about 1nsec to about 10msec. A plurality of first and second energy pulses has the same energy.
Bibliography:Application Number: KR20110065030