APPARATUS OF CLEANING BRUSH

PURPOSE: A brush cleaning apparatus is provided to suppress defects due to re-absorption of contaminants on the following wafer by removing the contaminants absorbed in the cleaning brush. CONSTITUTION: A cleaning bath(350) stores cleaning chemical solutions. Current supply electrodes(360) are input...

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Bibliographic Details
Main Author PARK, EUN KYUNG
Format Patent
LanguageEnglish
Korean
Published 07.07.2011
Subjects
INFORMATION STORAGE
PHYSICS
STATIC STORES
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Summary:PURPOSE: A brush cleaning apparatus is provided to suppress defects due to re-absorption of contaminants on the following wafer by removing the contaminants absorbed in the cleaning brush. CONSTITUTION: A cleaning bath(350) stores cleaning chemical solutions. Current supply electrodes(360) are inputted to the cleaning bath and provide a current. A brush(240) is immersed in the cleaning chemical solutions. Contaminated particles are removed from the brush by the electric attraction due to difference between the polarity of the current and the polarity of the contaminated particles absorbed in the brush and the rotation of the brush. The current supply electrode supplies the current with the opposite polarity to the contaminated particles.
Bibliography:Application Number: KR20090134678