METHOD FOR FABRICATING ELECTRODE OF PLATE TYPE DISPLAY DEVICE

PURPOSE: A method for fabricating electrode of a plate type display device is provided to implement a low power, a high aperture ratio, and a high transmittance. CONSTITUTION: A method for fabricating electrode of a plate type display device comprises steps of: forming a first photoresist pattern by...

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Bibliographic Details
Main Authors HYUN, HYE RIN, LEE, JUNG IL, KIM, JEONG OH, KIM, KANG IL, BANG, JUNG HO, HONG, GI SANG
Format Patent
LanguageEnglish
Korean
Published 07.07.2011
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Summary:PURPOSE: A method for fabricating electrode of a plate type display device is provided to implement a low power, a high aperture ratio, and a high transmittance. CONSTITUTION: A method for fabricating electrode of a plate type display device comprises steps of: forming a first photoresist pattern by processing a mask process after forming a first metal layer and spraying a photoresist layer; forming a first electrode(120) by etching the first metal layer; forming a second photoresist pattern by processing an ashing process; and forming a second electrode adjacent to the first electrode through a mask process after forming a second metal layer on a substrate in which a second photoresist pattern is formed.
Bibliography:Application Number: KR20090133881