METHOD OF OPERATING PROCESS CHAMBER FOR SEMICONDUCTOR DEVICE MANUFACTURING

PURPOSE: A process chamber operating method for manufacturing a semiconductor device is provided to maintain normally the state of a process chamber without the damage of a wafer by confirming the state of the process chamber before the implementation of a process with respect to the wafer. CONSTITU...

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Bibliographic Details
Main Authors SIM, SUN HWA, KIM, NATHAN
Format Patent
LanguageEnglish
Korean
Published 15.06.2011
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A process chamber operating method for manufacturing a semiconductor device is provided to maintain normally the state of a process chamber without the damage of a wafer by confirming the state of the process chamber before the implementation of a process with respect to the wafer. CONSTITUTION: A normal constant(Kss) displaying the normal state of a process chamber is set. The measurement constant displaying the current state of the process chamber is measured. The measurement constant and the normal constant are compared. Based on the comparison result, the operational condition of the process chamber is adjusted if the measurement constant is out of the range of the normal constant.
Bibliography:Application Number: KR20090122047