ELECTROSTATIC CHUCK

PURPOSE: An electrostatic chuck is provided to prevent damage to a target and the electrostatic chuck by intercepting the generation of plasma discharge around a fluid path. CONSTITUTION: In an electrostatic chuck, an insulating layer(300) is arranged on the top of a support stand(600) and supports...

Full description

Saved in:
Bibliographic Details
Main Authors KIM, SU HONG, PARK, MYOUNG SOO, CHUNG, HWA JUN, CHO, SUNG KEUN
Format Patent
LanguageEnglish
Korean
Published 31.05.2011
Subjects
BASIC ELECTRIC ELEMENTS
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PURPOSE: An electrostatic chuck is provided to prevent damage to a target and the electrostatic chuck by intercepting the generation of plasma discharge around a fluid path. CONSTITUTION: In an electrostatic chuck, an insulating layer(300) is arranged on the top of a support stand(600) and supports a target(100) to be processed. A space(200) for controlling the temperature of the target is formed between the target and the insulating layer. A first insulating member(700) and a second insulating member(800) are inserted inside the support stand. A fluid path for the cooling gas is formed by the first and second insulating members. The fluid path includes a stepped period of the fluid path.
Bibliography:Application Number: KR20090113153