APPARATUS AND METHOD FOR BONDING SUBSTRATE

PURPOSE: An apparatus and method for bonding substrates are provided to suppress the bending of a first substrate and a second substrate due to press difference by forming filling materials in a space between the first substrate and the second substrate. CONSTITUTION: A vacuum chamber comprises a bo...

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Bibliographic Details
Main Authors JUNG, WON WOONG, ROH, YOUN GOO, PARK, SANG YOUNG, CHA, YOU MIN, MUN, JU EEL
Format Patent
LanguageEnglish
Korean
Published 14.04.2011
Subjects
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Summary:PURPOSE: An apparatus and method for bonding substrates are provided to suppress the bending of a first substrate and a second substrate due to press difference by forming filling materials in a space between the first substrate and the second substrate. CONSTITUTION: A vacuum chamber comprises a bonding space for bonding a first substrate and a second substrate. A first pump(200) inhales the air of the bonding space with the first intensity. A second pump inhales the air of the bonding space with the second intensity. The second intensity is stronger than the first intensity. A nitrogen supply unit supplies nitrogen to the bonding space. A sensor(500) senses the pressure of the bonding space. A controller(600) controls the first pump, the second pump, and the nitrogen supply unit.
Bibliography:Application Number: KR20090095829