SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD

• Main Authors: YOSHIDA MASAAKI, SUGAWARA MAI, KOSHIYAMA JUN
• Format: Patent
• Language: English; Korean
• Published: 05.04.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A surface treating agent and a surface treating method are provided to implement silylation treatment with respect to the surface of a substrate and effectively suppress the collapse of inorganic patterns or resin patterns formed on the substrate. CONSTITUTION: A surface treating agent is used for implementing hydrophobic treatment with respect to the surface of a substrate. The surface treating agent includes a silylating agent and a solvent. The silylating agent includes at least one compound with a disilazane structure. The solvent includes the lactone compound with 5 or 6-membered rings. The lactone compound is one selected from a group including γ-butyrolactone, γ-valerolactone, δ- valerolactone, γ- hexanolactone, and δ-hexanolactone.