SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD

PURPOSE: A surface treating agent and a surface treating method are provided to implement silylation treatment with respect to the surface of a substrate and effectively suppress the collapse of inorganic patterns or resin patterns formed on the substrate. CONSTITUTION: A surface treating agent is u...

Full description

Saved in:
Bibliographic Details
Main Authors YOSHIDA MASAAKI, SUGAWARA MAI, KOSHIYAMA JUN
Format Patent
LanguageEnglish
Korean
Published 05.04.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PURPOSE: A surface treating agent and a surface treating method are provided to implement silylation treatment with respect to the surface of a substrate and effectively suppress the collapse of inorganic patterns or resin patterns formed on the substrate. CONSTITUTION: A surface treating agent is used for implementing hydrophobic treatment with respect to the surface of a substrate. The surface treating agent includes a silylating agent and a solvent. The silylating agent includes at least one compound with a disilazane structure. The solvent includes the lactone compound with 5 or 6-membered rings. The lactone compound is one selected from a group including γ-butyrolactone, γ-valerolactone, δ- valerolactone, γ- hexanolactone, and δ-hexanolactone.
Bibliography:Application Number: KR20100090349