PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, PHOTOSENSITIVE LAMINATE, METHOD FOR FORMING PERMANENT PATTERN AND PRINTED BOARD

PURPOSE: A photo-sensitive composition, a photo-sensitive film using the same, a photo-sensitive laminate, a method for forming a permanent pattern, and a printed board are provided to include the superior insulation reliability and to be used as solder resist for packages. CONSTITUTION: A photo-sen...

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Bibliographic Details
Main Authors TOMIZAWA HIDEKI, KAMIKAWA HIROSHI
Format Patent
LanguageEnglish
Korean
Published 23.03.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A photo-sensitive composition, a photo-sensitive film using the same, a photo-sensitive laminate, a method for forming a permanent pattern, and a printed board are provided to include the superior insulation reliability and to be used as solder resist for packages. CONSTITUTION: A photo-sensitive composition includes a binder, a polymeric compound, a photo-polymerization initiator, and an ion absorber. The ion absorber includes one or more of a bismuth compound, a zirconium compound, and an antimony oxide compound. The bismuth compound is a bismuth oxide. The zirconium compound is a zirconium phosphate. The antimony oxide compound is an antimony penta-oxide. The binder is selected from an epoxy (meta)acrylate resin, a (meta)acrylate resin, and a urethane resin.
Bibliography:Application Number: KR20100088643