METHOD OF FABRICATING SEMICONDUCTOR DEVICE

• Main Authors: JEON, KYUNG YUB, SONG, JONG HEUI, YANG, SONG YI
• Format: Patent
• Language: English; Korean
• Published: 10.03.2011
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PURPOSE: A semiconductor device manufacturing method is provided to reduce the micro loading which can occur during the process by etching the high dielectric material. CONSTITUTION: An underlying pattern is formed on a substrate(100). At least one dielectric layer is formed on the underlying patter...