LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Author: HARDEMAN TOON
• Format: Patent
• Language: English; Korean
• Published: 29.12.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TARIFF METERING APPARATUS; TESTING

PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to determine a defect on a grid plate based on a reflection signal of the grid plate. CONSTITUTION: An encoder type measuring system is provided to measure the position of a substrate table. The encoder type position measuring system determines the position of a substrate table with 6 degrees of freedom. A plurality of encoder heads(EH) are supplied on the substrate table. A grid plate(GP) is an object with a grid or lattice.