LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to determine a defect on a grid plate based on a reflection signal of the grid plate. CONSTITUTION: An encoder type measuring system is provided to measure the position of a substrate table. The encoder type positi...

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Bibliographic Details
Main Author HARDEMAN TOON
Format Patent
LanguageEnglish
Korean
Published 29.12.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASURING
MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE
MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TARIFF METERING APPARATUS
TESTING
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Summary:PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to determine a defect on a grid plate based on a reflection signal of the grid plate. CONSTITUTION: An encoder type measuring system is provided to measure the position of a substrate table. The encoder type position measuring system determines the position of a substrate table with 6 degrees of freedom. A plurality of encoder heads(EH) are supplied on the substrate table. A grid plate(GP) is an object with a grid or lattice.
Bibliography:Application Number: KR20100058026