RADIATION-SENSITIVE COMPOSITION, PROTECTIVE FILM AND INTER LAYER INSULATING FILM, AND PROCESS FOR FORMING THE SAME

PURPOSE: A radiation sensitive composition is provided to ensure excellent flatness, transparency, heat resistance (heat-proof transparency), surface hardness and scratch resistant, and to form a protective film and an inter layer insulating film with excellent crack resistance. CONSTITUTION: A radi...

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Bibliographic Details
Main Authors TSUYUKI RYOUTA, UEDA JIROU, TAKASE HIDEAKI, FUJIOKA MASAYASU
Format Patent
LanguageEnglish
Korean
Published 16.12.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE: A radiation sensitive composition is provided to ensure excellent flatness, transparency, heat resistance (heat-proof transparency), surface hardness and scratch resistant, and to form a protective film and an inter layer insulating film with excellent crack resistance. CONSTITUTION: A radiation sensitive composition comprises (A) a siloxane polymer, (B) at least one kind of a silane compound selected from the group consisting of compounds represented by chemical formulas(1) and (3), and (C) a radiation-sensitive acid generator or a radiation-sensitive base generator. In chemical formula 1, R^1 and R^3 are respectively an alkyl group of a carbon number 1~4; and R^2 is C1~6 alkylene group, phenylene group, and group represented by chemical formula 2.
Bibliography:Application Number: KR20100046438