METHOD FOR THIN LAYER DEPOSITION

• Main Authors: KHARCHENKO ANDRIY, DURANDEAU ANNE, NADAUD NICOLAS
• Format: Patent
• Language: English; Korean
• Published: 13.12.2010
• Subjects: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMISTRY; GLASS; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; THEIR RELEVANT APPARATUS; TRANSPORTING

The subject of the invention is a process for obtaining a material comprising a substrate and at least one at least partially crystalline titanium-oxide-based thin film deposited on a first side of said substrate, said process comprising the following steps: said at least one titanium-oxide-based thin film is deposited; said at least one titanium-oxide-based thin film is subjected to a crystallization treatment, supplying energy capable of raising each point of said at least one titanium-oxide-based thin film to a temperature of at least 300° C. while maintaining a temperature not exceeding 150° C. at any point on the opposite side of said substrate to said first side; said crystallization treatment being preceded by a deposition step, in which an energy-providing film is deposited above and/or below said titanium-oxide-based thin film, said energy-providing film being capable of absorbing the energy supplied during said crystallization treatment more effectively than said at least one titanium oxide film and/or of creating additional energy during said crystallization treatment, and of transmitting at least some of said energy to said at least one titanium-oxide-based thin film during said crystallization treatment.