GAS FLOW EQUALIZER PLATE SUITABLE FOR USE IN A SUBSTRATE PROCESS CHAMBER

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Bibliographic Details
Main Authors TODOROW VALENTIN N, BALAKRISHNA AJIT, WILLWERTH MICHAEL D, RAUF SHAHID, NGUYEN ANDREW
Format Patent
LanguageEnglish
Korean
Published 07.12.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Bibliography:Application Number: KR20107021616