CLEANING APPARATUS, SUBSTRATE PROCESSING SYSTEM, CLEANING METHOD, AND STORAGE MEDIUM

PURPOSE: While the EE maintenance unit is washed since the washing solution is sprayed in the maintenance unit of the holding member in which the cleaning device, the substrate processing system, and the cleaning solution and storage media do the maintenance of substrate, it prevents from the washin...

Full description

Saved in:
Bibliographic Details
Main Authors AMIYA MICHITAKA, ESHIMA KAZUYOSHI
Format Patent
LanguageEnglish
Korean
Published 22.11.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PURPOSE: While the EE maintenance unit is washed since the washing solution is sprayed in the maintenance unit of the holding member in which the cleaning device, the substrate processing system, and the cleaning solution and storage media do the maintenance of substrate, it prevents from the washing solution being attached to the spot in which the drying treatment in the holding member difficult base part. CONSTITUTION: In maintenance units(31p, 32p, 33p), the retaining groove for keeping substrate are plural number formed. The holding member(31) is expanded from the maintenance unit and base part in which the retaining groove is not formed are had. The washing of the maintenance unit is done since the cleaning unit dies of resentment the washing solution on the maintenance unit of the holding member.
Bibliography:Application Number: KR20100039409