METHOD FOR TREATING WASTED ORGANIC SOLVENT CONTAINING A CROSSLINKABLE PHOTORESIST COMPONENT

PURPOSE: A processing method of a waste organic solvent is provided to minimize the processing trouble by the cross-linking polymerization of a cross-linking photoresist component through the heat. CONSTITUTION: A processing method of a waste organic solvent comprises the following steps: adding a p...

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Bibliographic Details
Main Authors JEONG, JIN BAE, MUN, JAE WOONG, JEONG, HYUN CHEOL, LEE, MYUNG HO, KANG, DO SOON
Format Patent
LanguageEnglish
Korean
Published 15.10.2010
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE: A processing method of a waste organic solvent is provided to minimize the processing trouble by the cross-linking polymerization of a cross-linking photoresist component through the heat. CONSTITUTION: A processing method of a waste organic solvent comprises the following steps: adding a polymerization inhibitor to the waste organic solvent including a cross-linking photoresist component for controlling the cross-linking polymerization; and collecting an organic solvent from the waste organic solvent mixed with the polymerization inhibitor.
Bibliography:Application Number: KR20090029824