APPARATUS FOR TREATING SUBSTRATE

• Main Authors: MIYASAKO HISAAKI, SUEYOSHI HIDEKI
• Format: Patent
• Language: English; Korean
• Published: 29.09.2010
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PURPOSE: A substrate processing apparatus is provided to be accurately installed in a processing bath using the upper side of a connecting unit which is connected with a lower frame as a reference surface. CONSTITUTION: A processing bath(1) includes a frame body including a lower frame(2), an upper...