APPARATUS FOR TREATING SUBSTRATE

PURPOSE: A substrate processing apparatus is provided to be accurately installed in a processing bath using the upper side of a connecting unit which is connected with a lower frame as a reference surface. CONSTITUTION: A processing bath(1) includes a frame body including a lower frame(2), an upper...

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Bibliographic Details
Main Authors MIYASAKO HISAAKI, SUEYOSHI HIDEKI
Format Patent
LanguageEnglish
Korean
Published 29.09.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A substrate processing apparatus is provided to be accurately installed in a processing bath using the upper side of a connecting unit which is connected with a lower frame as a reference surface. CONSTITUTION: A processing bath(1) includes a frame body including a lower frame(2), an upper frame(3), and a supporting unit(4). The internal space of the transversal unit(2a) of the lower frame is connected with the internal space of four units(3a), which form the upper frame, through the internal space of the supporting unit. An exhaust pipe(6) is arranged on the external side of the upper frame.
Bibliography:Application Number: KR20100023402