IMPRINT APPARATUS AND METHOD

• Main Authors: KOHDA TOHRU, INADA HIROSHI, SATO HIROSHI, AOKI AKIO, INA HIDEKI
• Format: Patent
• Language: English; Korean
• Published: 24.09.2010
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PURPOSE: An imprint apparatus and a method thereof are provided to implant a pattern on a shot area of a substrate by hardening a resin, pressed against the pattern side of the mold, on the substrate. CONSTITUTION: A resin(13) is coated on the shot area of a substrate(12). The pattern surface(15) of a mold(11) is pressed against the resin on the substrate. A pattern(16) is formed on a pattern side. The resin is flowed into a concave part of the pattern through a capillary phenomena. UV light hardens the resin to transfer the pattern of the mold on the substrate. The resin is coated through first and second dispensers.