LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Authors: VAN DE RIJDT JOHANNES HUBERTUS ANTONIUS, DE VOS YOUSSEF KAREL MARIA, KUNST RONALD CASPER, VAN KEMPEN ROBERTUS JACOBUS THEODORUS, VERVOORDELDONK MICHAEL JOHANNES
• Format: Patent
• Language: English; Korean
• Published: 02.09.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

PURPOSE: A lithography apparatus and a device manufacturing method are provided to reduce the thermal stress caused within a substrate table by a magnetic member by dividing a magnetic member of an actuator into a plurality of sub members and installing the sub members on a table separately. CONSTITUTION: A position setting assembly(200) comprises a substrate table(210) which is arranged in order to accept a substrate(220) on a central zone(230) of a substrate table. A projection system is configured to project a patterned radiation beam on the target part of a substrate in a first direction. A location establishment device establishes the location of the substrate table.