EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE

• Main Author: NEMOTO RYOUJI
• Format: Patent
• Language: English; Korean
• Published: 26.08.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: An apparatus and a method for an exposing process, and a method for manufacturing a panel substrate for displaying are provided to monitor each mirror operation of a spatial optical-modulator by forming a phase on an optical-receiving surface of an image-taking apparatus using optical beam which is reflected by a mirror in an off-state. CONSTITUTION: An optical fiber(22) introduces optical beam from a lower light source unit(21) into an optical beam radiating apparatus(20). The optical beam from the optical fiber is radiated to digital micro-mirror device(DMD)(25). The DMD modulates the optical beam by operating a plurality of mirrors which is bidirectionally arranged. The optical beam which is reflected by a part of mirrors of the DMD in an off-posture is radiated to a phase-forming lens. The optical beam which is reflected by the other part of mirrors of the DMD in an on-posture is radiated to a heat part(20a) including a projection lens(26).